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Validation of etching model of polypropylene layers exposed to argon plasmas
Validation of etching model of polypropylene layers exposed to argon plasmas
2019
Carles Corbella
Adam Pranda
Sabine Portal
Teresa de los Arcos
Guido Grundmeier
G. S. Oehrlein
Achim von Keudell
Keywords:
Materials science
Analytical chemistry
Polypropylene
Etching
Argon
Chemical engineering
Plasma
Correction
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