Thickness calculations of thin films prepared by pulsed laser deposition on revolved and rotated substrates

We present a modified model of film thickness from pulsed laser deposition on tilted substrates. A substrate rotated in front of the plume and a substrate revolved around the target are considered. The model is based on coordinate system transformations mapping projections of flux onto tilted substrates. Thickness profiles for the revolved substrate varies more rapidly with angle compared to the rotated substrate. Average thickness increases with angle for the rotated system and decreases for the revolved system. This behavior is expected for a strongly-forward plume expansion. Calculated roughness tends to decrease for both geometries for angles above 10o.