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Effect of Peak Current Density on Inner-wall Deposition of Ti Films by High-power Impulse Magnetron Sputtering
Effect of Peak Current Density on Inner-wall Deposition of Ti Films by High-power Impulse Magnetron Sputtering
2020
Hidetoshi Komiya
Yoshikazu Teranishi
Ana B. Chaar
Ming Yang
Tetsuhide Shimizu
Keywords:
Optoelectronics
High-power impulse magnetron sputtering
peak current
Deposition (law)
Materials science
Correction
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