Laser-induced damage in optical materials under UV excimer laser radiation

The studies of laser damage resistance of silica glass and fluoride crystals performed at ArF, KrF, and XeF excimer laser wavelengths with a pulse duration of approximately 80 ns have given the following data: the dependence of the bulk damage threshold on irradiated spot size, ranging in value from 6 to 1200 micrometers ; temperature dependence of laser damage resistance; the influence of metal admixtures on damage threshold; the influence of ionizing radiation on damage resistance; the coefficients of nonlinear absorption; frequency dependence of the bulk damage threshold for silica glass in the UV region.