A method for plasma chemical preparation of halogenated oligosilanes of tetrachlorosilane

The present invention relates to a method and apparatus for preparing halogenated oligosilanes of silicon and tetrachlorosilane. In the prior art halogenated oligosilanes such as Si These reactions provide primarily SiCl Furthermore, resulting contamination of the end products because of similar boiling points can be separated only with great effort. The new method should provide the desired products in high yield and purity. The synthesis is carried out in a catalytic cycle using HCl as a catalyst. The reaction takes place in the first step with silicon at about 270 ° C and in the second step in a cold plasma. A partial chlorination completes the synthesis. The yield of this process in excess of the known methods. The process is suitable for preparing halogenated oligosilanes such as Si This find such. As in the deposition of silicon nitride in CVD processes use.