High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics

In this paper, distributed-axis technology is applied to high-speed scanning electron microscopy for large scale inspection and metrology of nanostructures. Simulated results indicate that each aperture in the retarding electrode must be kept to less than 0.1mm diameter to avoid extra aberrations and that extra slots be provided to accommodate the spread in the trajectories of the secondary electrons with different energies (up to 10eV) 4 . Experimental verification of these simulated results is underway.