Decomposition of Ethanethiol Using Dielectric Barrier Discharge Combined with 185 nm UV-Light Technique

The removal of gaseous ethanethiol (EtSH) via dielectric barrier discharge (DBD) combined with 185 nm UV-light energized by a DBD power supply has been investigated. EtSH removal efficiency and energy yield had been examined as a function of EtSH initial concentration, input power, gas flow rate and relative humidity of gas flow. The results showed that DBD combined with 185 nm UV-light could improve EtSH removal efficiency by about 10.4 % and increase energy yield by 0.4 g (kWh)−1 as compared with DBD treatment only. When increasing initial EtSH concentration and flow rate, a higher energy yield was obtained. And EtSH removal efficiency increased as the relative humidity increased to about 70 %, then decreased when the humidity continue to increase. Moreover, the possible reaction pathways were proposed based on the products identified by FT-IR.