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Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
2011
Kazuyuki Tomida
Mihaela Popovici
Johan Swerts
Mugwort Wang
Ben Kaczer
M. A. Pawlak
Sven Van Elshocht
Min-Soo Kim
Ingrid Debusschere
Valeri Afanas'ev
L. Altimime
Jorge A. Kittl
Keywords:
Rutile
Dram
Optoelectronics
mechanism analysis
Materials science
Leakage (electronics)
process development
Correction
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