Spatially patterned wire ends

The present invention provides a system for forming one or more types of wire ends spatial structure. In some embodiments, forming a first patterned second hard mask (HM) HM region above the first region. In some embodiments, the first region and the second sacrificial sacrificial HM HM HM region of the first region in a second pattern or a first region of at least one of HM above. HM sacrificial region over the second patterned photoresist (PR), and the deposition region above the spacer and the second sacrificial HM region PR. In some embodiments, the spacer region, PR or brother sacrificial HM at least some of the at least one removed. Accordingly, the first patterned second hard mask (HM) area is patterned, thereby forming a spatial structure associated with the end of the line end space. The present invention further provides a wire end of one pattern space.