Improved Endurance and Resistive Switching Stability in Ceria Thin Films Due to Charge Transfer Ability of Al Dopant

An improvement in resistive switching (RS) characteristics of CeO2-based devices has been reported by charge transfer through Al metal as a dopant. Moreover, density functional theory (DFT) calculations have been performed to investigate the role of Al-layer sandwiched between CeO2 layers by the Vienna ab initio simulation package (VASP). Total density of states (TDOS) and partial electron density of states (PDOS) have been calculated and analyzed with respect to resistive switching. It is established that the oxygen vacancy based conductive filaments are formed and ruptured in the upper region of CeO2 layer, because of the fact that maximum transport of charge takes place in this region by Al and Ti (top electrode), while the lower region revealed less capability to generate conductive filaments because minimum charge transfer takes place in this region by Al and/or Pt (bottom electrode). The effect of Al and Al2O3 on both the electronic charge transfer from valence to conduction bands and the formation ...