Ion-beam lithography

Abstract Ion beam lithography (IBL) is still in the hands of researchers. The immediate aim is to investigate the production of micro-circuits with 0.1 μm line spacings in commercial prototypes. However such instruments can also be used for mask repair. The present paper, intended as an introduction to the more specialised contributions to IBL in these Proceedings, concentrates on basic physical principles. While ion sources of different types are covered, particular attention is paid to liquid metal ion sources, in view of their popularity and potential for a variety of applications in focused ion beam technology.