Old Web
English
Sign In
Acemap
>
Paper
>
Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing
Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing
2008
Nelson Felix
Anuja De Silva
Christopher K. Ober
Keywords:
Supercritical fluid
Nanotechnology
Nanolithography
Resorcinarene
Microfabrication
Photolithography
Inorganic chemistry
Materials science
Resist
Organic chemistry
high resolution
Correction
Source
Cite
Save
Machine Reading By IdeaReader
35
References
13
Citations
NaN
KQI
[]