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Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments
Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments
2013
Alexander D. Dolgov
D.V. Lopaev
Christopher James Lee
Vladimir Krivtsun
K N Koshelev
O. F. Yakushev
Frederik Bijkerk
Keywords:
Plasma
Materials science
Carbon
Optoelectronics
Extreme ultraviolet lithography
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