A method of depositing metal on a substrate and device for its implementation Óoeuvre.

A method of vapor deposition of a metal on a substrate, and device for implementing this method. The method includes: (a) producing a metal halide, in situ, from a production means (11) included in a reaction chamber (10) containing the substrate ( 30), by contacting a gaseous halogen with a heated solid metal, and (b) reducing, in said reaction of chloride (10), said metal halide gas produced during step ( a) in the presence of at least one reducing gas, to obtain a pure metal deposit, at a rate of the order of mu m per minute, on said substrate. The device comprises means (11) in situ production of a gaseous metal halide, which comprises at least in combination :. a source of halogen gas (22); . a support (20) containing a metal in solid form; . means for homogenizing the output stream of the gaseous metallic halide formed towards the substrate; and heating means and temperature control (21).