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An alignment procedure for nanoimprint lithography at the sub-20 nm level
An alignment procedure for nanoimprint lithography at the sub-20 nm level
2005
David Adolph
Erik Bolmsjö
Elke Theander
R Saers
Mariusz Graczyk
Dan Hessman
Ivan Maximov
Stefan Andersson-Engels
Å Persson
Claes-Göran Wahlström
Marc Beck
Patrick Carlberg
Babak Heidari
Lars Montelius
Keywords:
Nanoimprint lithography
Nanotechnology
Chemistry
Correction
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