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Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM | NIST
Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM | NIST
2008
Chengqing C. Wang
Ronald L. Jones
Kwang-Woo Choi
Christopher L. Soles
Eric K. Lin
Wen-Li Wu
James S. Clarke
John S. Villarrubia
Benjamin Bunday
Keywords:
Small-angle X-ray scattering
NIST
Surface finish
Analytical chemistry
Materials science
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