Effect of chemical polishing in titanium materials for low outgassing

A chemical polishing using a nitric acid solution was found to be the most suitable for the titanium materials. 1.8 nm of small surface roughness was observed in a microscopic range in 1 μm square, and 7 nm of a thin oxide layer was shown to exist for the chemically polished titanium. The surface processing for the titanium was developed combining the chemical polishing and the precision cleaning. The chemically polished pure titanium of JIS grade 2 showed extremely low outgassing rate below 10-12 Pams-1 after baking process, which is two orders of magnitude smaller than that for standard vacuum materials under the same baking condition. Outgassing rates of the titanium is about 1/5 of that for a stainless steel without baking process.