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Effects of oxygen radical irradiation on the interface property of Al 2 O 3 /p-Ge grown by Atomic Layer Deposition
Effects of oxygen radical irradiation on the interface property of Al 2 O 3 /p-Ge grown by Atomic Layer Deposition
2017
Daichi Yamada
Yohei Otani
Chiaya Yamamoto
Junji Yamanaka
Tetsuya Sato
Hiroshi Okamoto
Yukio Fukuda
Keywords:
Radiochemistry
Nanotechnology
High-κ dielectric
Radical
Atomic layer deposition
Irradiation
Chemistry
Analytical chemistry
mos capacitor
Materials science
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