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New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node
New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node
2007
Hiroshi Tomita
Yuji Yamada
Hidenobu Nagashima
Norio Ishikawa
Yumiko Taniguchi
Keywords:
Composite material
Metallurgy
Materials science
Wet cleaning
Environmental chemistry
Nanotechnology
Surface charge
Correction
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