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Physical properties of mist CVD-derived HZO films dependent on post deposition annealing by RTA
Physical properties of mist CVD-derived HZO films dependent on post deposition annealing by RTA
2021
Yuki Fujiwara
Onishi Junya
Hiroyuki Nishinaka
Masahiro Yoshimoto
Minoru Noda
Keywords:
Materials science
Chemical engineering
Mist
Ferroelectricity
Annealing (metallurgy)
Deposition (chemistry)
Correction
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