CMOS Scaling Beyond High-k and Metal Gates

Historically, CMOS scaling has provided the means to realize higher performance with every technology node. At each node, the technologist’s almost always have managed to scale the devices with minimal change to the conventional CMOS process flow. However, scaling has clearly reached fundamental material limits, especially for gate oxide, and hence we now are in the era where further scaling can be realized mainly by new materials and/or device architecture.