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HIGH RATE MAGNETRON ION ETCHING FOR SILICON DEVICES.
HIGH RATE MAGNETRON ION ETCHING FOR SILICON DEVICES.
1983
I. Lin
D.C. Hinson
Walter H. Class
R. Stander
Michael Hill
W. Vanden Bossche
Keywords:
Ion
Optoelectronics
Cavity magnetron
Silicon
Etching (microfabrication)
high rate
Materials science
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