Manufacturing method of electrode structure with nanogap length, electrode structure with nanogap length and nano-device obtained through manufacturing method

A substrate (1) on which metal layers (2A and 2B) are arranged in pairs at an interval is immersed into an electroless plating solution, wherein the electroless plating solution is prepared by mixing a reducing agent and an interfacial agent into an electrolyte containing metal ions; the metal ions are reduced through the reducing agent; metal is separated out of the metal layers (2A and 2B) and the interfacial agent is attached to the surface of the metal to form an electrode (4A and 4B) pair of controlling the gap length into the nanoscale. Therefore, a manufacturing method of an electrode structure which can control a gap length deviation and has a nanogap length is provided. Furthermore, the electrode structure with the nanogap length capable of inhibiting the gap length deviation and a nano-device with the electrode structure are provided by employing the manufacturing method.