Resistance metal layer and manufacture thereof

1992 
PURPOSE: To manufacture a resistance metal layer, which has undergone simple electrodeposition with good reproducibility and has superior resistance characteristic, safely at a low cost by applying the resistance layer including the compound material of a metal component and a non-metallic additive. CONSTITUTION: A resistance layer 16 laminated on a substrate 12 includes the composite of the metal component of normal conductivity and the nonmetalic additive of the amount increasing the resistance value. Here, the metal component contains chromium. The nonmetallic additive contains C or N or the combination of two or more of C, N and P of about 0.001 atom per one atom of the metal component in the bulk of the resistance layer 16. Furthermore, the metal component contains average of about 80wt.% or more of the bulk of the resistance layer 16. Furthermore, a conducting layer 16 is laminated thereon. In this laminate 10, a conducting layer 18 and the resistance layer 16 can be sequentially etched by using two kinds of etching liquids. Thus, the resistance layer, which can undergo electrodeposition with good reproducibility and can be manufactured safely at a low cost, can be obtained.
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