Aligning system and aligning method

The aligning system and method is suitable for aligning optical mask before exposure in semiconductor or LCD manufacture process. The aligning system includes aligning unit, at least one image processing unit, and at least one monitoring display device. The aligning unit has several image pick-up devices for monitoring simultaneously the aligning state between optical mask marks and corresponding substrate marks on one substrate. The image processing unit converts the picked up signal into image signal to make the images displayed simultaneously on the monitoring display device.