Crossover of electron-electron interaction effect in Sn-doped indium oxide films

We systematically study the structures and electrical transport properties of a series of Sn-doped indium oxide (ITO) films with thickness t ranging from ∼5 to ∼53 nm. Scanning electron microscopy and x-ray diffraction results indicate that the t ≲ 16.8 nm films are polycrystalline, while those t ≳ 26.7 nm films are epitaxially grown along [100] direction. For the epitaxial films, the Altshuler and Aronov electron-electron interaction (EEI) effect governs the temperature behaviors of the sheet conductance σ□ at low temperatures, and the ratios of relative change of Hall coefficient ΔRH/RH to relative change of sheet resistance ΔR□/R□ are ≈2, which is quantitatively consistent with Altshuler and Aronov EEI theory and seldom observed in other systems. For those polycrystalline films, both the sheet conductance and Hall coefficient vary linearly with logarithm of temperature below several tens Kelvin, which can be well described by the current EEI theories in granular metals. We extract the intergranular tun...