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酸化膜,窒化膜付シリコンウエハの950℃における放射熱物性
酸化膜,窒化膜付シリコンウエハの950℃における放射熱物性
1989
Shigeki Hirasawa
Tomoji Watanabe
Takuji Torii
Toshiyuki Uchino
Takaaki Doi
Keywords:
LOCOS
Wafer
Thermal radiation
Optoelectronics
Materials science
Composite material
Equivalent oxide thickness
Rapid thermal processing
Correction
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