Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates

Various polycrystalline silicon thin films were deposited on Al2O3 ceramic substrates by RTCVD processing under different deposition conditions. The influence of deposition conditions on thin film quality was studied and a set of typical processing parameters were obtained, which would direct the RTCVD processing of thin film silicon solar cell technique.