An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems
2008
We present advancements in the manufacture of high-performance diffractive optical elements (DOEs) used in
stepper/scanner off-axis illumination systems. These advancements have been made by employing high resolution
lithographic techniques, in combination with precision glass-etching capabilities. Enhanced performance of DOE designs
is demonstrated, including higher efficiency with improved uniformity for multi-pole illumination at the pupil plane,
while maintaining low on-axis intensity.
Theoretical predictions of the performance for several classes of DOE designs will be presented and compared with
experimental results.
This new process capability results in improved performance of current DOE designs, and enables greater customization
including control of the output spatial intensity distribution for future designs. These advancements will facilitate
continuous improvements in off-axis illumination optimization required by the end user to obtain larger effective
lithographic process windows.
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