Optical Studies of Microstructure in a-Si:H

A set of samples grown under different substrate temperature has been characterised by complex optical, photoelectrical and transport measurements. A very sensitive and simple method for detection of optical scattering in a device quality amorphous silicon has been demonstrated. The spectral dependence of the optical scattering coefficient αs(E) can give us information on the nature and concentration of the scattering centers in a-Si:H thin films.