Amorphization of Ni/Ti multilayers studied by electrical conductance measurements

Abstract Ni/Ti multilayers with composition-modulation wavelengths ranging from 35 to 103 A were annealed at 458 K during approximately 30 h and studied by electrical resistivity measurements and transmission electron microscopy (TEM). The diminution of the electrical conductance during the solid state reaction can be explained by the formation of an amorphous phase at every Ni/Ti interface. The variation of the conductance follows a shifted t 1 2 law for long times. We deduced values of interdiffusion coefficients which are in good agreement with those measured by other methods. A linear time law for short times is expected for an interface limited reaction.