Method for preparing organic microchannel plate by employing MEMS technology

The invention provides a method for preparing an organic microchannel plate by employing an MEMS technology. The method comprises the following steps of (1) preparing a silicon-based substrate with a high aspect ratio structure by employing the MEMS technology; (2) depositing organic matters on the silicon-based substrate prepared in the step (1) by employing an ALD or chemical vapor deposition method; (3) removing redundant organic matters on the surface of the silicon-based substrate in a mechanical thinning manner and exposing the upper surface of the substrate; (4) removing the silicon-based substrate in a chemical corrosion manner to form an organic microchannel; and (5) depositing a conductive layer and a secondary electron emission layer in the organic microchannel through an atomic layer deposition process and finally obtaining the organic microchannel plate. The organic microchannel plate prepared by the method has the advantages of a low dielectric constant and a low dielectric loss, and high amplitude and low loss performance of pulse voltage in a framing camera can be ensured, so that the gain strength and the gain uniformity of the framing camera are improved.