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Large Area a-Si/μc-Si Tandem Module Production with VHF (40 MHz) PECVD Deposited a-Si Layers
Large Area a-Si/μc-Si Tandem Module Production with VHF (40 MHz) PECVD Deposited a-Si Layers
2010
B. Stannowski
U. Klemm
K. H. Ahn
A. Schwabedissen
Keywords:
Analytical chemistry
Plasma-enhanced chemical vapor deposition
Materials science
Optoelectronics
Tandem
Correction
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