Fabrication and characterization of low period W/B4C multilayer

Low period W/B4C multilayers are fabricated using magnetron sputtering system. The periods of multilayer are d ∼1.84 to 1.53 nm at a fixed number of layer pairs N = 400. Multilayers are characterized using hard x-ray reflectivity (XRR) at 20 keV and transmission electron microscope (TEM). XRR results well correlated with TEM observations. The measured structural parameters reveal good quality of multilayer structure. At 20 keV, measured reflectivities are 55% and 26 % for MLs with d ∼ 1.84 nm and 1.53 nm, respectively.