Method for manufacturing ???3 layer by CVD

The present invention relates to, Alq In the present invention, a method of manufacturing a thin film using a chemical vapor deposition method, 1) the method comprising positioning the substrate in the reaction chamber and keeping the inside of the reaction chamber at a certain reaction temperature; And 2) placing into the reaction chamber, supplying a raw material of aluminum and 8-hydroxyquinoline-based material, and the reaction; The It provides Alq3 thin film manufacturing method characterized in that it comprises. An organic EL, the light emitting layer, Alq3, chemical vapor deposition method