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Plasma etching defect formation and changes in the electronic and structural properties of InP/InAsP quantum wells
Plasma etching defect formation and changes in the electronic and structural properties of InP/InAsP quantum wells
2017
Jean-Pierre Landesman
Juan Jiménez
Christophe Levallois
Cesare Frigeri
A. Torres
Yoan Léger
Keywords:
Optoelectronics
Quantum well
Plasma etching
Materials science
Correction
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