Method for producing a metal carbonitride film or metalloid carbonitride film manufacturing apparatus of the metal carbonitride film or metalloid carbonitride film and the metal carbonitride film or metalloid carbonitride film

To provide a method and apparatus for a metal carbonitride film or metalloid carbonitride film may be formed at a low temperature. The general formula (1) [Formula 1] (Wherein, the plurality of R, may be the same or different, each represents a hydrogen atom, a linear 1 to 5 carbon atoms, branched or cyclic alkyl group, or a 1-9 carbon atoms It shows a trialkylsilyl group. the plurality of R may be bonded to each other to form a ring.) A nitrogen source comprising a guanidine compound represented in, and a metal source or metalloid source is supplied onto the film-forming target to deposit a metal carbonitride film or metalloid carbonitride film.