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Determination of Acid Diffusiomin Chemical Amplification Positive Deep-UV Resists : Resist and Processes
Determination of Acid Diffusiomin Chemical Amplification Positive Deep-UV Resists : Resist and Processes
1992
Leo Schlegel
Takumi Ueno
Nobuaki Hayashi
Takao Iwayanagi
Keywords:
Organic chemistry
Resist
Chemistry
photoacid generator
chemical amplification
Chemical engineering
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