An immersion scanner enabling 10 nm half pitch production and high productivity
2015
Nikon's newly developed immersion scanner, NSR-S630D, provides exceptional performance in product overlay, CD uniformity, and productivity at 10 nm hp node and beyond. Generally, maintaining machine accuracy and productivity at a high level is difficult because they are in a trade-off relationship. The NSR-S630D is equipped with new features including an encoder servo-controlled reticle stage, reticle bending mechanism, optics with enhanced thermal aberration control, and thermally stable wafer stage. These features enable the NSR-S630D to deliver highest accuracy and productivity.
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