Effect of thermal annealing on disorder and optical properties of Cr/Si bilayer thin films

Chromium/silicon bilayers are deposited by sequential electron beam evaporation on quartz substrates. The bilayers consisting of Cr and Si layers of 50 and 400 nm thicknesses, respectively, are subjected to post-deposition annealing at temperatures from 200 to 700 °C. The thermal annealing results in the interdiffusion between Cr and Si, as evidenced by cross-section scanning electron micrographs and the line profiles obtained from energy-dispersive X-ray spectroscopy. It is inferred from the compositional line profiles that the films are a combination of silicon-rich oxide, chromium oxide and unreacted Cr up to 500 °C. Chromium disilicide forms at temperatures greater than 500 °C with decrease in chromium oxide content. The refractive index value and extinction coefficient values are 2.1 and 0.12 in the as-deposited case which increase to 3.5 and 0.24 at 400 °C. These values decrease to 2.1 and 0.12 at 500 °C. At the same temperatures, the band gap values are 2.21, 2.40 and 2.28, respectively. Thus, the ...