Pattern formation and photophysical applications of Langmuir-Blodgett multilayers based on polyglutamates

Abstract Langmuir-Blodgett multilayers from ternary copolymers of γ-methyl-, γ-octadecyl-, and γ-(11-cinnamoylundec-1-yl)- L -glutamate were prepared. Pattern formation by UV irradiation through a mask and by electron beam is demonstrated. Optical loss measurements on waveguiding films (500 layers/thickness 870 nm) yielded an attenuation of 3.6 dB/cm at 633 nm.