Fabrication of Fluorine Doped Tin Oxide (FTO) Thin Films Using Spray Pyrolysis Deposition Method For Transparent Conducting Oxide

Fluorine doped tin oxide (FTO) thin films were prepared by using Ammonium Fluoride (NH 4 F) and DBTDA. These two solutions were mixed and finally get the Fluorine doped with tin oxide. The solution then proceeds to spray pyrolysis process to produce the FTO substrate. This works is focused on produc i ng high  transparency materials above 85% which allows more sunlight absorption by the inner part of solar cell. Besides, the fabrication of thin film with low sheet resistance is investigated for enhancing the conductivity. The sample then anneal with different annealed temperature. Surface Morphology of FESEM show the particle distribution and size of FTO of all the annealed temperatures used in this research. From this method, by adjusting the anneal temperature the best film obtained is at 150 o C anneal temperature which has the sheet resistance of 5.11 Ω/sq and highest percentage of transmittance.