High-Resolution and Large-Area Patterning of Highly Conductive Silver Nanowire Electrodes by Reverse Offset Printing and Intense Pulsed Light Irradiation

Conventional printing technologies such as inkjet, screen, and gravure printing have been used to fabricate patterns of silver nanowire (AgNW) transparent conducting electrodes (TCEs) for a variety of electronic devices. However, they have critical limitations in achieving micrometer-scale fine line width, uniform thickness, sharp line edge, and pattering of various shapes. Moreover, the optical and electrical properties of printed AgNW patterns do not satisfy the performance required by flexible integrated electronic devices. Here, we report a high-resolution and large-area patterning of highly conductive AgNW TCEs by reverse offset printing and intense pulsed light (IPL) irradiation for flexible integrated electronic devices. A conductive AgNW ink for reverse offset printing is prepared by carefully adjusting the composition of AgNW content, solvents, surface energy modifiers, and organic binders for the first time. High-quality and high-resolution AgNW micropatterns with various shapes and line widths ...