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Enabling EUV Ressist Research at the 1 and Smaller Regime
Enabling EUV Ressist Research at the 1 and Smaller Regime
2015
Patrick P. Naulleau
Christopher N. Anderson
Weilun Chau
Kenneth A. Goldberg
Antone Wojdyta
Suchit Bhattarai
Andrew R. Neureuther
Frank Goodwin
Mark Neisser
Keywords:
Nanotechnology
Materials science
Extreme ultraviolet
Optoelectronics
Photoresist
Extreme ultraviolet lithography
Phase-shift mask
Correction
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