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Annealing behavior of crystalline silicon heavily implanted with oxygen at low temperature
Annealing behavior of crystalline silicon heavily implanted with oxygen at low temperature
1997
M. Bercu
I. S. Zevenbergen
T. Gregorkiewicz
C.A.J. Ammerlaan
T. Tate
E. Ivanov
Keywords:
Internal medicine
Annealing (metallurgy)
Endocrinology
Medicine
Oxygen
Radiochemistry
Crystalline silicon
Chemical engineering
Materials science
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