Growth and Characterization of a GaAs Quantum Well Buried in GaAsP/GaAs Vertical Heterostructure Nanowires by Selective-Area Metal Organic Vapor Phase Epitaxy

We developed a growth method for forming a GaAs quantum well (QW) buried in GaAsP/GaAs heterostructure nanowires (NWs) by selective-area metal organic vapor phase epitaxy (SA-MOVPE). To determine the optimum growth conditions of GaAsP NWs, we varied the [(C4H9)PH2+ AsH3]/[(CH3)3Ga] ratio between 20 and 185. As a result, we could obtain NWs with good height uniformity when the ratio was 20. To form such NWs with a GaAs QW, we fabricated GaAs NWs of about 60 nm in diameter before the GaAsP growth. The NW uniformity was considerably improved by introducing GaAs growth. Photoluminescence (PL) measurements at 4.2 K indicated that the QW had a spectral peak about 150 meV higher than the acceptor-related recombination emission peak of GaAs, which is near 1.5 eV. The QW thickness estimated from the spectral peak energy of PL was 5.2 nm, which is in fair agreement with the value calculated from the GaAs growth rate.