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Acemap > Paper > Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology (Phys. Status Solidi A 7∕2017)

Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology (Phys. Status Solidi A 7∕2017)

2017 
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