Direct integration of Pb(Zr,Ti)O3 thin films : a pathway towards high-speed modulators
2021
Our digital world is growing at great speed implying the constant need for improving the network
quality, broadening band widths allowing fast data traffic. Electro-optic modulators (see figure) are
used in these state-of-the-art networks and are much faster than classic electrical switches. Tuned
constructive and destructive interaction of light waves is achieved by changing the refractive
index of the modulator material. A ferroelectric material as Pb(Zr,Ti)O3 is often used in these kind of
modulators. Up to now, epitaxial integration of the ferroelectric material is difficult because of the
amorphous nature of the photonic platforms. Therefore, in this work we propose the local epitaxial
integration with the high-pockels coefficient Pb(Zr,Ti)O3 material for electro-optic modulation on
state-of-the-art SiN photonic platforms by using the low-cost and efficient ink-jet printing technique.
This deposition technique requires stable precursor solutions with appropriate rheological properties
which allow the construction of a 2D electro-optic thin Pb(Zr,Ti)O3 layer pattern on SiN platforms
without the use of additional etching steps.
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