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Low-temperature diffusion of oxygen and formation of thermal donors in silicon doped with an isovalent germanium impurity
Low-temperature diffusion of oxygen and formation of thermal donors in silicon doped with an isovalent germanium impurity
1995
V. M. Babich
N. P. Baran
K. I. Zotov
V. L. Kiritsa
V. B. Kovalchuk
Keywords:
Thermal
Analytical chemistry
Impurity
Germanium
Doping
Oxygen
Silicon
Materials science
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