Effects of Facet Growth and Nucleation on Microcrystalline Silicon by Numerical Model

We have presented a model of microcrystalline silicon (μc-Si) growth based on the Van der Drift model. The model needs growth velocities of the facets (100) and (111), an amorphous silicon growth velocity and a grain nucleation rate. The growth velocity ratio of the facets, (100) and (111), determines the preferred orientation and the morphology of the μc-Si film, especially oriented to (110). As the grain nucleation rate increases, the ratio of the living grain number to the total grain number decreases and the crystallinity increases, so the grain nucleation rate governs the trade-off relation of the μc-Si cells between decreasing the open circuit voltage and increasing the short circuit current as the crystallinity increases.